| 材质：合金 | 产地：合肥 | 规格：高纯可定制 |
| 用途：半导体电子、光学玻璃AR膜系 | 电阻率：≤50 |
产品说明Product description
以等离子体为热源，在大气环境下通过一定的气氛保护装置，将Si+Al粉末加热到熔融或半熔融状态并高速冲击背管表面形成致密涂层，从而制备出高纯度、低氧含量、高致密度SiAl靶材。
With plasma as the heat source, high purity, low oxygen content, high density SiAl targets are produced by using Si and Al powders. The starting Si and Al powders are heated to molten or semi-molten state with the protection of certain atmosphere and sprayed on the surface of backing tube at high speeds to form dense coatings.
项目 Item | 参数 Specifications | 检测手段 Testing method |
纯度 Purity | ≥99.9% | |
Al含量 Al Content | 8-10% | |
密度 Density | ≥2.2 g/cm3 | |
杂质含量 Impurities | Fe: ≤350 ppm Ca: ≤50 ppm Cu: ≤50 ppm Mg: ≤20 ppm Ni: ≤20 ppm O: ≤6000 ppm N: ≤500 ppm 杂质总和(O、N除外): ≤1000 ppm Total impurity (excluding O, N) | ICP 氧氮分析仪 Oxygen and nitrogen analyzer
|
电阻率 Electrical resistivity | ≤50 mΩ?cm | 四探针电阻率仪 Four-probe resistivity meter |
背管材质 Backing tube
-选用304/316L不锈钢（无磁）
304/316L stainless steel (non-magnetic)
靶材尺寸Dimension
-按照图纸要求加工
According to customized drawings
应用领域Applications
-用于制作SiO2膜、Si3N4膜，主要用于光学玻璃AR膜，LOW-E镀膜玻璃，半导体电子器件，TFT-LCD，平面显示，触摸屏玻璃。
For deposition of SiO2 and Si3N4 films, which are used for AR films of optical glasses, LOW-E glasses, electronic devices, TFT-LCD, flat panel screens, touch screen glasses.
定制：可按客户要求定制，请咨询我们。
